Cerium oxide for polishing powder

Relying on advanced hydrometallurgy and calcination processes, we have launched ultra-high purity (99.95%) Cerium oxide products. This material not only has a strict stoichiometric ratio, but also can precisely control the particle size and distribution according to customer requirements. Its outstanding suspension and chemical reactivity make it perform exceptionally well in the fields of semiconductor polishing, high-efficiency catalytic carriers , providing continuous and stable material support for cutting-edge manufacturing.