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High Purity Pentasilicide Titanium Nanoparticles Ti5Si3-100nm
Basic information:
Titanium silicide is widely used in the manufacture of gates, source/drain, interconnects and ohmic contacts for metal oxide semiconductors (MOS), metal oxide semiconductor field effect transistors (MOSFETs), and dynamic random memories (DRAMs): high purity, small particle size, uniform distribution, high specific surface area, high surface activity, and low bulk density.
Application:
Titanium silicide is widely used in the manufacture of gates, source/drain, interconnects and ohmic contacts for metal oxide semiconductors (MOS), metal oxide semiconductor field effect transistors (MOSFETs), and dynamic random memories (DRAMs): high purity, small particle size, uniform distribution, high specific surface area, high surface activity, and low bulk density.
Certificate
The products have been approved by FDA,REACH,ROSH,ISO and other certification, in line with national standards.
Advantage
Quality First
Competitive Price
First-class Production Line
Factory Origin
Customized Services
Factory
Packing
1kg/ bag; 25kg/ barrel;
20 tons/1×20‘FCL Shipment.
FAQ:
Q: Are you trading company or manufacturer ?
A: We are factory.
Q: How long is your delivery time?
A: Generally it is 5-10 days if the goods are in stock. or it is 15-20 days if the goods are not in stock, it is according to quantity.
Q: Do you provide samples ? is it free or extra ?
A: Yes, we could offer the sample for free charge but do not pay the cost of freight.
Q: What is your terms of payment ?
A: Payment<=1000USD, 100% in advance. Payment>=1000USD, 30% T/T in advance ,balance before shippment.
